Spring Seminar 2010
April 30-May 2
at the
Meritage Resort and Spa
Presented by
The San Francisco Intellectual Property Law Association

The 2010 Annual Spring Seminar will take place the weekend of April 30-May 2, at the majestic Meritage Resort & Spa, located at the southern tip of Napa Valley near where Napa and Sonoma meet. The Meritage Resort and Spa offers an experience like no other, has recently hosted Bravo's Top Chef finale, and is an exciting new resort with wonderful amenities—from the Meritage Resort and Spa's wine cave, exclusive underground spa, on site winery, and golf courses close by. The Meritage Resort and Spa has something for everyone.
This year, we are very pleased to be partnering with the San Francisco Bay Area Licensing Executive Society (LES) and will be offering additional licensing programs. The educational programs will take place Saturday and Sunday mornings and will include speakers from various aspects of intellectual property law. In addition to our educational program, you will also have the opportunity to mingle and network with your fellow attendees and LES colleagues in the world renowned Napa Valley.
Please stay tuned for more detailed information which will be announced soon!
Select one of the following registration and
payment options:
Registration Form - Pay
by Check
Registration Form - Pay
by Credit Card using PayPal
MCLE:
The San Francisco Intellectual Property Law Association is a State
Bar of California approved MCLE provider and certifies that this
activity conforms to the standards for approved education activities
prescribed by the rules and regulations of the State Bar of California
governing Minimum Continuing Legal Education. The SFIPLA will
maintain copies of the MCLE sign-in sheet for this seminar for
a period not to exceed four (4) years. While the SFIPLA provides
Certificates of Attendance to each Attendee, it is the Attendee's
responsibility to verify his/her attendance at the Seminar by
signing the SFIPLA's MCLE sign-in sheet for each day of seminar
attendance.
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